Raith software download

Fresnel zone plates are widely used as diffractive-based focusing elements in X-ray microscopy, achieving resolutions down to 25 nm. While they are typically prepared by EBL, this application note shows how the fabrication of zone plates by a dedicated FIB nanofabrication system Raith ionLINE is able to significantly reduce the fabrication steps while still deliver the necessary high resolution. Electrical characterization of nanowires with usual probing stations requires the use of metal electrodes with a size of several microns.

Various methods are used to contact electrodes and nanowires. This application note describes an alternative approach that makes use of in-situ electrical measurements and proves to be much more efficient and less time-consuming than traditional methods.

In research environments, 2D materials are often randomly distributed on a substrate. One of the biggest challenges is the accurate placement of multiple process steps on top of them.

This application note presents an innovative workflow including automated mapping of the sample and offline data preparation for efficient use of the EBL tool resources.

Many applications in photonics, optoelectronics, displays, biosensors, etc. To complement serial EBL writings, this application note describes the combination of an electron beam lithography system and photolithography system to efficiently fabricate periodic nanostructures over large areas with high precision and high throughput. Are you working on a Raith system and have achieved a remarkable result? Downloads Nanofabrication Literature A broad selection of PDF downloads is available to provide better understanding or more information on specific subjects.

Application Notes Our customers work in all sorts of different fields and continually achieve great results. White Paper Get detailed insights into specific topics and learn all about a certain topic in more depth.

Scientific Publications Professional journals in a variety of disciplines have been publishing the work and results of Raith customers for a long time. Press Releases Find out what makes the news. More details. Automated step and repeat exposures are easily controlled by editing a position list task list or using drag-and-drop features.

They can also be embedded in a complex, fully automated patterning process sequence containing not only the patterning jobs themselves, but also macros or scripts for column setup or exposure parameter changes, drift, beam current or focus correction, and even automated complex metrology or sample inspection tasks for process control. Multilevel lithography : Many lithography applications require alignment to existing structures or patterns.

Raith systems offer software control over hardware alignment, meaning the writing field orientation is physically shifted , scaled , or rotated relative to the fixed sample such that additional features can be perfectly overlaid and implemented into existing ones.

The user can assist during the mark registration procedure or apply fully automated mark registration sequences. Proximity Effect Correction and 3D resist exposure simulation : Some applications require very accurate dose control in order to deliver optimum clearing doses, which can be crucial for fabricating dense nanostructures such as optical gratings or photonic crystals.

The proximity effect correction package helps to optimize dose distribution for critical parts of your design. In order to identify, model, and optimize those critical parts prior to exposure, a 3D resist development simulation module is an integral part of the Raith Nanosuite.